Apparatus to detect and quantify radical concentration in semiconductor processing systems
Measures reactive radicals in a semiconductor process chamber so a controller can adjust the process using concentration feedback.
01 / Patent portfolio
Inventions,
in detail.
Systems that measure, transform and control. Explore Mehran Moalem's work in semiconductor processing, plasma technology, emissions treatment and optics.
Browse the patent records36Granted US patents
10Still pending
46 patents in the portfolio. The rest are still in the pipeline.
Inside the inventions
From the drawing board.
Original drawings from the patent documents. Select an image for a closer look.
Methods for treating exhaust gas in a processing system
Treats semiconductor exhaust by injecting a reagent and separate cleaning gas into the foreline and plasma source.
System and method for using digital displays without optical correction devices
Adjusts displayed images or light direction to help viewers see without separate optical correction devices.
Method and apparatus for controlling a processing system
Controls a processing system by monitoring chamber pressure and adjusting vacuum-pump idle operation.
Remote plasma source
Describes a remote plasma source built from coupled tubes, electrical isolation parts, and a capacitive element.
Acoustic resonance sensor devices for radical species detection with enhanced filters
Adds a selective coating to a resonant sensor so radical exposure changes its measured frequency.
The collection
Patent records
Plasma & process diagnostics
11 recordsUS20260040896A1
Apparatus to detect and quantify radical concentration in semiconductor processing systems
Measures reactive radicals in a semiconductor process chamber so a controller can adjust the process using concentration feedback.
Technical details
A processing tool measures neutral radical concentrations with a neutral radical mass spectrometry analyzer coupled to a processing chamber. The analyzer includes a modulator chamber and a residual gas analyzer or mass spectrometer, with an unobstructed line of sight.
Inventors: Mehran Moalem
Assignee: Applied Materials Inc
US20250118538A1
Remote plasma source
Describes a remote plasma source built from coupled tubes, electrical isolation parts, and a capacitive element.
Technical details
A remote plasma system has first and second tubes joined by isolation components and a capacitive element coupled to an isolation component.
Inventors: Kartik Ramaswamy, Mehran Moalem, Farhad Moghadam, Eller Y. Juco
Assignee: Applied Materials Inc
US20250098541A1
Acoustic resonance sensor devices for radical species detection with enhanced filters
Adds a selective coating to a resonant sensor so radical exposure changes its measured frequency.
Technical details
A radical sensor includes a piezoelectric resonator and a filter that selectively reacts with a radical species; the reaction changes the resonator frequency.
Inventors: Jia Pelpa, Mehran Moalem, Mehdi Balooch, Damodar Shanbhag
Assignee: Applied Materials Inc
US20250093300A1
Using acoustic resonance sensor devices for radical species detection to monitor processing chamber conditions
Uses a resonant sensor and controller to monitor radical levels and infer processing chamber conditions.
Technical details
A radical sensor in a processing chamber measures a change in resonant frequency that correlates with radical concentration, and a controller determines chamber conditions from that change.
Inventors: Jia Pelpa, Mehran Moalem, Manuel A. Hernandez, Ryan Pakulski
Assignee: Applied Materials Inc
US20250093299A1
Corrosion-resistant acoustic resonance sensor devices for radical species detection
Describes a sealed, electrically isolated holder and connector assembly for a radical sensor.
Technical details
A radical sensor assembly includes a holder, sensor, electrical transmission line, flange, and connector with electrical isolation and sealing members.
Inventors: Jia Pelpa, Mehran Moalem, Mehdi Balooch, Damodar Shanbhag
Assignee: Applied Materials Inc
US20230375506A1
Sensor for measurement of radicals
Measures radical concentration through frequency changes in a coated quartz crystal sensor.
Technical details
A quartz crystal microbalance carries a coating that reacts selectively with radicals; the resulting resonant-frequency change correlates with the amount of radicals reacted.
Inventors: Mehran Moalem, Mehdi Balooch
Assignee: Applied Materials Inc
US20230145789A1
Methods and materials for making elastomer resistant to degradation by ultraviolet radiation and plasma
Describes seal materials and tool arrangements intended to reduce elastomer degradation under ultraviolet and plasma exposure.
Technical details
A semiconductor processing tool has an elastomer seal with a polymer structure selected to resist ultraviolet radiation and plasma exposure.
Inventors: Mehran Moalem
Assignee: Applied Materials Inc
US20230060529A1
High-power density RF remote plasma source apparatus
Presents a compact radio-frequency plasma source made from connected plasma legs with magnetic layers and coils.
Technical details
A plasma source has plasma legs joined by corner connectors; each leg includes a conductive shell, magnetic layer, and primary coil.
Inventors: Mehran Moalem, Kartik Ramaswamy
Assignee: Applied Materials Inc
US20220415617A1
Remote plasma apparatus for generating high-power density microwave plasma
Describes a dielectric microwave plasma source designed to generate plasma efficiently in a compact space.
Technical details
A plasma source uses a dielectric body with intersecting gas passages and a monopole antenna extending into the body.
Inventors: Mehran Moalem
Assignee: Applied Materials Inc
US20220415612A1
High-efficiency RF remote plasma source apparatus
Routes gas through multiple plasma zones surrounded by magnetic cores to improve remote plasma generation.
Technical details
A plasma source divides gas among parallel paths and plasma zones surrounded by magnetic cores; a radio-frequency coil wraps around the cores.
Inventors: Mehran Moalem, Kartik Ramaswamy
Assignee: Applied Materials Inc
US20220392812A1
Apparatus to detect and quantify radical concentration in semiconductor processing systems
Introduces an analyzer for quantifying reactive radicals in semiconductor processing equipment.
Technical details
A neutral radical mass spectrometry analyzer is coupled to a processing chamber to measure neutral radical concentrations.
Inventors: Mehran Moalem
Assignee: Applied Materials Inc
Emissions & process safety
16 recordsUS20190282956A1
Methods for treating exhaust gas in a processing system
Treats semiconductor exhaust by injecting a reagent and separate cleaning gas into the foreline and plasma source.
Technical details
Exhaust from a process chamber flows through a foreline and plasma source; a reagent and a different cleaning gas are injected to treat the exhaust.
Inventors: Colin John Dickinson, Mehran Moalem, Daniel O. Clark
Assignee: Applied Materials Inc
US20170173521A1
Methods for treating exhaust gas in a processing system
Uses pressure control and plasma conversion to make process exhaust easier to abate.
Technical details
A non-reactive gas maintains a desired exhaust-conduit pressure before plasma is formed from the exhaust and a reagent gas.
Inventors: Colin John Dickinson, Mehran Moalem, Daniel O. Clark
Assignee: Applied Materials Inc
US20110135552A1
Methods and apparatus for treating exhaust gas in a processing system
Adds reagent and controlled gas delivery to a plasma source in a semiconductor exhaust line.
Technical details
An apparatus treats exhaust in a substrate-processing foreline using a plasma source, upstream reagent delivery, and a foreline gas injection kit with pressure monitoring.
Inventors: Colin John Dickinson, Mehran Moalem, Daniel O. Clark
Assignee: Applied Materials Inc
US20100192773A1
Abatement apparatus with scrubber conduit
Uses a wetted sloped conduit between scrubbers to capture and remove particles from exhaust.
Technical details
An abatement system routes effluent from a scrubber through a wetted conduit that captures and washes particles before a central scrubber.
Inventors: Daniel O. Clark, Colin John Dickinson, Jay J. Jung, Daniel Stephan Brown, Mehran Moalem, Frank F. Hooshdaran, Morteza Farnia, Barry Page, Gary Sypherd, Jonathan Dahm, Phil Chandler
Assignee: Applied Materials Inc
US20090216061A1
Systems and methods for treating flammable effluent gases from manufacturing processes
Reduces exhaust flammability during abatement bypass by mixing in a second gas.
Technical details
An exhaust system monitors an abatement unit and can mix a second gas with diverted effluent to reduce the mixture's flammability during bypass operation.
Inventors: Daniel O. Clark, Mehran Moalem, Robbert M. Vermeulen, Phil Chandler
Assignee: Applied Materials Inc
US20090018688A1
Methods and systems for designing and validating operation of abatement systems
Tests and tunes an exhaust abatement system by measuring its removal efficiency and changing its design or operation.
Technical details
An integrated abatement system is tested by producing target-species effluent, measuring destruction removal efficiency, and modifying design or operating parameters to improve it.
Inventors: Phil Chandler, Daniel O. Clark, Robbert M. Vermeulen, Belynda Flippo, Mehran Moalem, Charles Murray
Assignee: Applied Materials Inc
US20080290041A1
Methods and apparatus for efficient operation of an abatement system
Coordinates process-tool and abatement-tool shutdown using system information.
Technical details
An electronic-device manufacturing system receives information related to an abatement system and shuts down a process tool and abatement tool in response.
Inventors: Daniel O. Clark, Robbert M. Vermeulen, Youssef A. Loldj, Belynda Flippo, Mehran Moalem, Shaun W. Crawford
Assignee: Applied Materials Inc
US20080102011A1
Treatment of effluent containing chlorine-containing gas
Treats chlorine-bearing process exhaust with hydrogenation, water scrubbing, and combustion steps.
Technical details
A hydrogenation reactor treats chamber exhaust to form hydrogen chloride, a scrubber dissolves the hydrogen chloride, and oxygen is added for further combustion treatment.
Inventors: Mehran Moalem, Morteza Farnia
Assignee: Applied Materials Inc
US20080081130A1
Treatment of effluent in the deposition of carbon-doped silicon
Uses an additive gas and plasma reactor to treat exhaust from carbon-doped silicon deposition.
Technical details
An oxygen-containing additive gas and plasma treat effluent from carbon-doped silicon deposition to reduce unreacted precursor and byproducts.
Inventors: Morteza Farnia, Mehran Moalem
Assignee: Applied Materials Inc
US20080014134A1
Methods and apparatus for PFC abatement using a CDO chamber
Adds a catalyst bed to an existing oxidation chamber to remove perfluorocarbon exhaust.
Technical details
A catalyst bed is placed in a controlled decomposition oxidation chamber and exposed to a gaseous waste stream to abate perfluorocarbons.
Inventors: Sebastien Raoux, Kuo-Chen Lin, Robbert Vermeulen, Daniel Clark, Stephen Tsu, Mehran Moalem, Allen Fox, Monique McIntosh, Joshua Putz, Eric Rieske, Poh Lee
Assignee: Applied Materials Inc
US20080003158A1
Methods and apparatus for PFC abatement using a CDO chamber
Uses a catalyst bed in an oxidation chamber to treat perfluorocarbon exhaust.
Technical details
A catalyst bed in a pre-installed controlled decomposition oxidation chamber is exposed to a gaseous waste stream to abate perfluorocarbons.
Inventors: Sebastien Raoux, Kuo-Chen Lin, Robbert Vermeulen, Daniel Clark, Stephen Tsu, Mehran Moalem, Allen Fox, Monique McIntosh, Joshua Putz, Eric Rieske, Poh Lee
Assignee: Applied Materials Inc
US20080003157A1
Methods and apparatus for PFC abatement using a CDO chamber
Reuses heat from treated exhaust to preheat incoming exhaust and improve energy efficiency.
Technical details
A controlled decomposition oxidation system transfers heat from treated exhaust to incoming exhaust to preheat the incoming stream before catalytic treatment.
Inventors: Sebastien Raoux, Kuo-Chen Lin, Robbert Vermeulen, Daniel Clark, Stephen Tsu, Mehran Moalem, Allen Fox, Monique McIntosh, Joshua Putz, Eric Rieske, Poh Lee
Assignee: Applied Materials Inc
US20080003151A1
Methods and apparatus for PFC abatement using a CDO chamber
Places catalyst and heat-transfer fixtures in a removable cartridge for exhaust treatment.
Technical details
A cartridge holding catalyst material and thermally conductive fixtures is inserted into a controlled decomposition oxidation chamber to abate perfluorocarbons.
Inventors: Sebastien Raoux, Kuo-Chen Lin, Robbert Vermeulen, Daniel Clark, Stephen Tsu, Mehran Moalem, Allen Fox, Monique McIntosh, Joshua Putz, Eric Rieske, Poh Lee
Assignee: Applied Materials Inc
US20080003150A1
Methods and apparatus for PFC abatement using a CDO chamber
Combines wet scrubbing with catalytic oxidation to reduce perfluorocarbons in exhaust.
Technical details
A wet scrubber feeds a controlled decomposition oxidation chamber with a catalyst bed that abates perfluorocarbons in a gaseous waste stream.
Inventors: Sebastien Raoux, Kuo-Chen Lin, Robbert Vermeulen, Daniel Clark, Stephen Tsu, Mehran Moalem, Allen Fox, Monique McIntosh, Joshua Putz, Eric Rieske, Poh Lee
Assignee: Applied Materials Inc
US20070022958A1
Abatement of fluorine gas from effluent
Removes fluorine gas from semiconductor process exhaust using a catalytic reactor.
Technical details
A catalytic reactor reduces fluorine gas in process effluent, optionally after reactive gases are added in a prescrubber or from a gas source.
Inventors: Shamouil Shamouilian, Mehran Moalem, Tony Kaushal
Assignee: Applied Materials Inc
US20020192129A1
Abatement of fluorine gas from effluent
Removes fluorine gas from process exhaust using a catalytic reactor and optional upstream gas treatment.
Technical details
A catalytic reactor reduces fluorine gas in process effluent, optionally after reactive gases are added in a prescrubber or from a gas source.
Inventors: Shamouil Shamouilian, Mehran Moalem, Tony S. Kaushal
Assignee: Applied Materials Inc
Optics & imaging
01 recordsUS20150356714A1
System and method for using digital displays without optical correction devices
Adjusts displayed images or light direction to help viewers see without separate optical correction devices.
Technical details
A computer-implemented display system adjusts images for a user's vision, including by directing light or processing image data to compensate for optical abnormalities.
Inventors: Mehran Moalem
Materials & manufacturing
04 recordsUS20120204965A1
Method and apparatus for controlling a processing system
Controls a processing system by monitoring chamber pressure and adjusting vacuum-pump idle operation.
Technical details
A vacuum pump operates at a selected idle speed while chamber pressure is monitored to determine whether a target baseline pressure can be maintained.
Inventors: Youssef A. Loldj, Jay J. Jung, Mehran Moalem, Paul E. Fisher, Joshua Putz, Andreas Neuber
Assignee: Applied Materials Inc
US20100139554A1
Methods and apparatus for making gallium nitride and gallium aluminum nitride thin films
Forms gallium-based nitride films by combining gallium vapor and plasma-activated ammonia.
Technical details
Gallium nitride or gallium aluminum nitride films are formed by exposing a substrate to gallium vapor and ammonia plasma.
Inventors: Morteza Farnia, Mehran Moalem
Assignee: Applied Materials Inc
US20090238972A1
Methods and apparatus for using reduced purity silane to deposit silicon
Describes silicon deposition using silane with lower purity than conventional ultra-high-purity feedstock.
Technical details
A silicon layer is deposited by introducing hydrogen and silane into a chamber, where the silane is below 99.999 percent purity.
Inventors: Daniel O. Clark, Mehran Moalem, Robbert M. Vermeulen, Yong Kee Chae, Charles Gay, John M. White, Robert Z. Bachrach, Jay J. Jung
Assignee: Applied Materials Inc
US20090017206A1
Methods and apparatus for reducing the consumption of reagents in electronic device manufacturing processes
Recovers and reuses process reagents through scrubber, polishing, and drying equipment.
Technical details
A reagent reclaim system connects a substrate-coating chamber to a wet scrubber, polisher, dryer, and gas box to recover process reagents.
Inventors: Daniel O. Clark, Robert Z. Bachrach, Mehran Moalem, Jay J. Jung
Assignee: Applied Materials Inc
Summaries introduce the technical subject of each record. The full patent document contains the claims and legal scope. Publication is distinct from a patent grant; a grant does not establish current legal status.